Hard X-Ray and Extreme UV Wavefront Sensors

 Hard X-Ray and Extreme UV Wavefront Sensors - 宏惠光電股份有限公司

Product name : Hard X-Ray and Extreme UV Wavefront Sensors
Description :
HASO HXR Wavefront Sensor
The HASO HXR provides live measurement of the optical quality of your beamline at strategic positions such as after the monochromator, after an optics or a sample. Fluctuations of the position of a focal point can also be characterized.

HASO EUV Wavefront Sensor
The HASO EUV offers unsurpassed quality, precision and ease of use for ultra-short wavelength beam characterization, adjustment and alignment.

The specifications provided on this page are for reference only. Actual product specifications are subject to the manufacturer’s latest official information.
Specification
PRODUCT NAME PUPIL SIZE W x L (mm2) PHASE POINT RESOLUTION MICROLENS NUMBER / (LIFT PH. P. RES.) MAX FREQ. (Hz) WAVELENGTH (nm) REPEATABILITY (RMS λ/n) ABSOLUTE ACCURACY (RMS λ/n)
HASO HXR 3 x 3 22500 150 x 150 10 0.05 - 0.25 (5-25 keV) 30 10
HASO EUV 13 x 13 5184 72 x 72 1 4 - 40 (30 - 300 eV) 200 50

 

HASO HXR HASO EUV
BEST FOR
– Source characterization
– Real-time alignment of optical systems, e.g., KB, toroidal, etc.
– Phase imaging of biological material, nanoparticles, archeological artifacts
– Precise driving of X-Ray active optics
BEST FOR
– HHG, synchrotron and EUV-FEL beam alignment and characterization 
– Mirror alignment in beamlines, Bender optimization 
– Stability characterization 
– Schwarzschild telescope alignment and characterization 
– Zoneplace characterization 
– Plasma science