High Resolution Microscopy Slide Targets

Product name : High Resolution Microscopy Slide Targets
Description :
High Resolution Microscopy Slide Targets are designed using high-precision e-beam lithography. The patterns are etched on a 10 × 10mm² fused silica substrate with broad spectral transmission (DUV-VIS-NIR), on which a chromium layer of high optical density is applied. By removing the chromium layer, patterns are created in sizes down to 100nm. High Resolution Microscopy Slide Targets provide excellent dimensional stability and are mounted in a metal microscope slide holder. The negative patterns on each target allow the structures to be transparent, while the background is blocked by a chrome layer.

● Small Pattern Sizes - 100nm and 3300 lp/mm
● Composed using High-Precision E-Beam Lithography
● Negative Pattern Design